HORIBA STEC japan Worldwide
News & EventsCompanyProcurement HomeContactsSite MapJapaneseUSEurope
Products & Support Mass Flow Controller Liquid Flow and Vaporizer Vacuum and Gas Monitor Pressure Controller Semiconductor Process Product List
 Home > Products & Support > Semiconductor Process

To top page of Products for Semiconductor/FPD Industry
List by Production Process

Please click on the process for further information.
Wafer Fabrication Process s_image
Wafer Fabrication Process image
Mask Fabrication Process Image
Mask Fabrication Process Image
Front-end Process Image
Front-end Process Front-end Process Image
Back-end Process Image
Back-end Process Back-end Process Image
Image Back-end Process

Lithography Process
·
Reticle/Mask Particle Detection System
 
PR-PD2
·
Reticle/Mask Particle Detection System
 
PR-PD3
             

Material Analysis
·
Photoluminescence Spectrophotometer
·
Cathode Luminescence Measuring Equipment
 
MP Series
             

Material Analysis (Particulates Analysis & Defect Analysis)
·
Energy Dispersive X-ray Analyzer
 
EMAX ENERGY
·
X-ray Microscope
 
XGT-5000
 
·
Glow Discharge Optical Emission Spectroscopy
 
GD-Profiler 2
 
·
Raman Spectrophotometer
  
             

DI Water Analysis (Wet Process)
·
In-line Particle Sensor(Ultra-pure Watar)
 
PLCA-800
·
Dissolved Oxygen Monitor
 
SD-300
 
·
Silica Monitor
 
SLIA-300
 
·
2-Channel Resistivity Meter
 
HE-960RW
 
 
·
Silica Analyzer
 
SLIA-2000
       
         
Pure Water Instrumentation icon
  

Drain Water Analysis
·
Fluoride Ion Monitor
 
FLIA-101
·
Free Fluoride Ion Monitor
 
IF-250
 
·
Total Nitrogen/Total Phosphorus Measurement System
 
TPNA-300
       
             

Gas Control/Analysis (Dry Process)
·
FTIR Gas Analyzer
 
FG-100A Series
·
Digital Mass Flow Controller
 
SEC-Z500X Series
 
·
In-line Gas Monitor
 
IR-150S/150L
 
·
Vaporized Liquid Source Control System
 
LSC-A100 Series
 
 
·
Automatic Pressure Regulator
 
UR-7340/7350 Series
 
·
Liquid Auto Refill System
 
LU-A1000 series
 
 
·
Liquid InjectionSystem
 
MI/MV / VC Series
 
·
Mass Flow Controller
 
SEC-4001 / 8000 Series
 
         
Gas Monitoring Instrumentation icon
  

Process Monitoring (Dry Process)
·
Residual Gas Analyzer
 
MICROPOLE™ System
   
             

Thin Film Control/Analysis
·
Plasma Diagnosis Endpoint Monitor
 
PLASMASCOPE
·
Full Automatic Spectroscopic Ellipsometer
 
UT-300
 
·
Plasma Diagnosis Endpoint Monitor
 
DIGICPMJ
 
·
Full Automatic Raman Analyzer
 
FR-3000
 
 
·
Real Time Interferometric Film Thickness Monitor
 
LEM-CT670
 
·
Visible Spectroscopic Ellipsometer
 
MM-16
 
 
·
Real Time Interferometric Film Thickness Monitor
 
DIGILEM-CPM
 
·
Single-wavelength Ellipsometer
 
PZ2000
 
 
·
Spectroscopic Ellipsometer
 
UVISEL
       
             

Chemical Analysis (Wet Process)
·
SC-1 Monitor
 
CS-131
·
HF/HCL/NH3 Concentration Monitor
 
HF-960M
 
·
SC-2 Monitor
 
CS-152
 
·
Dissolved Ozone Monitor
 
HZ-960
 
 
·
FPM Monitor
 
CS-153
 
·
Resistivity Meter
 
HE-480R
 
 
·
BHF Monitor
 
CS-137
 
·
2-Channel Carbon Sensor Resistivity Meter
 
HE-960RW-GC
 
 
·
HF/HNO3Monitor
 
CS-153N
 
·
Carbon Sensor Resistivity Meter
 
HE-960R-GC
 
 
·
Fiber Optic Type Chemical Solution Concentration Monitor
 
CS-100F1 Series
 
·
Conductivity Meter (Low Density Type)
 
HE-480C
 
 
·
TMAH/H2O2 Monitor
 
CS-139E
 
·
Conductivity Meter (High Density Type)
 
HE-480H
 
 
·
SPM Monitor
 
CS-150
 
·
TMAH Conductivity Meter
 
HE-960TM
 
 
·
Hydrofluoric Acid Monitor
 
CM-200/210
 
·
Liquid Mass Flow Meter/Controller
 
LF-F/LV-F Series
 
 
·
In-line Particle Sensor (Chemicals/Resist)
 
PLCA-800
       
         
Instrumentation for Solutions used in the Process icon
  

CMP Process
·
Laser Scattering Particle Size Distribution Analyzer
 
LA-950
·
Dynamic Light Scattering Particle Size Distribution Analyzer
 
LB-550
             

Ambient Monitoring in Clean Room
·
Airborne Molecular Contaminants Monitor
    
             


TOP
Copyright (C) 2008 HORIBA STEC, Co.,Ltd. All rights reserved.

Copyright © 2008 HORIBA STEC, Co.,Ltd. All rights reserved. The information shown on this document may be modified without notice. Refer to the original web page for update. The page was copied from:
 
Explore the future HORIBA STEC